利用X射线摇摆曲线(XRC)研究了V面(22-43)图案化蓝宝石衬底(PSS)上(20-21)GaN薄膜的晶格面曲率和晶格面倾斜等晶体形态。
从GaN(20–22)和(12–31)衍射的非对称XRC结果发现,晶格面倾斜高度依赖于薄膜厚度和生长条件。TEM分析证实,在(22-43)PSS上(20-21)GaN薄膜的C面抑制生长过程中,通过调节V/III比可以有效地抑制基面层错的产生。
Item | 2-inch V-plane(22-43) 430μm Sapphire Wafers | |
Crystal Materials | 99,999%, High Purity, Monocrystalline Al2O3 | |
Grade | Prime, Epi-Ready | |
Surface Orientation | V-plane(22-43) | |
Diameter | 50.8 mm +/- 0.1 mm | |
Thickness | 430 μm +/- 25 μm | |
Primary Flat Orientation | A-plane(11-20) +/- 0.2° | |
Primary Flat Length | 16.0 mm +/- 1.0 mm | |
Single Side Polished | Front Surface | Epi-polished, Ra < 0.5 nm (by AFM) |
(SSP) | Back Surface | Fine ground, Ra = 0.8 μm to 1.2 μm |
Double Side Polished | Front Surface | Epi-polished, Ra < 0.5 nm (by AFM) |
(DSP) | Back Surface | Epi-polished, Ra < 0.5 nm (by AFM) |
TTV | < 10 μm | |
BOW | < 10 μm | |
WARP | < 10 μm | |
Cleaning / Packaging | Class 100 cleanroom cleaning and vacuum packaging, | |
25 pieces in one cassette packaging or single piece packaging. |
注:可提供任意晶向和厚度的定制蓝宝石晶片。